Description
A gentle yet powerful mud cream mask thoroughly removes skin impurities and dead skin cells clogged inside pores with moisturizing aftercare to keep skin clean and plump.
Formulated with Amazon White Clay and 250,000ppm of Kaolin to gently remove excess sebum, dead skin cells and dirt from skin and clear clogged pores for achieving healthy and glowy skin.
Packed with Hyaluronic Acid, Ceramide NP and Opuntia Ficus-Indica Stem Extract to replenish rich moisture to dry skin and prevent skin from dehydration after deep cleansing.
Effectively calms irritated and sensitive skin with Ivy Leaf/Stem Extract and Centella Asiatica Extract.
Hypoallergenic tested.
How to use
1. Prep your skin with toner after cleansing. You can steam your face during shower or with hot towel for 30 seconds to achieve a better cleansing effect.
2. Apply a moderate amount evenly onto face, avoiding eye and mouth areas.
3. Rinse off thoroughly with lukewarm water.
Ingredients
Water, Kaolin (250,000 ppm), Glycerin, Caprylic/Capric Triglyceride, Hectorite, 1,2-Hexanediol, Glyceryl Stearate SE, Sorbitan Olivate, Cetearyl Olivate, Cetyl Alcohol, Phoenix Dactylifera (Date) Fruit Extract, Ficus Carica (Fig) Fruit Extract, Portulaca Oleracea Extract, Sodium Hyaluronate, Ceramide NP, Ethylhexylglycerin, Pyrus Communis (Pear) Fruit Extract, Sodium Acrylate/Sodium Acryloyldimethyl Taurate Copolymer, Hedera Helix (Ivy) Leaf/Stem Extract, Polyisobutene, Butylene Glycol, Opuntia Ficus-Indica Stem Extract, Opuntia Coccinellifera Fruit Extract, Fragaria Chiloensis (Strawberry) Fruit Extract, Pyrus Malus (Apple) Leaf Extract, Adansonia Digitata Seed Extract, Sorbitan Oleate, Caprylyl/Capryl Glucoside, Crithmum Maritimum Callus Culture Filtrate, Centella Asiatica Extract
Ingredients subject to change at manufacturer's discretion. For the most complete and up-to-date list of ingredients, please refer to product packaging.